De-bonding and cleaning process and system

ABSTRACT

Methods and tools for de-bonding and cleaning substrates are disclosed. A method includes de-bonding a surface of a first substrate from a second substrate, and after de-bonding, cleaning the surface of the first substrate. The cleaning comprises physically contacting a cleaning mechanism to the surface of the first substrate. A tool includes a de-bonding module and a cleaning module. The de-bonding module comprises a first chuck, a radiation source configured to emit radiation toward the first chuck, and a first robot arm having a vacuum system. The vacuum system is configured to secure and remove a substrate from the first chuck. The cleaning module comprises a second chuck, a spray nozzle configured to spray a fluid toward the second chuck, and a second robot arm having a cleaning device configured to physically contact the cleaning device to a substrate on the second chuck.

BACKGROUND

The semiconductor industry has experienced rapid growth due tocontinuous improvements in the integration density of a variety ofelectronic components (e.g., transistors, diodes, resistors, capacitors,etc.). For the most part, this improvement in integration density hascome from repeated reductions in minimum feature size (e.g., shrinkingthe semiconductor process node towards the sub-20 nm node), which allowsmore components to be integrated into a given area. As the demand forminiaturization, higher speed and greater bandwidth, as well as lowerpower consumption and latency has grown recently, there has grown a needfor smaller and more creative packaging techniques of semiconductordies.

Coupled with this miniaturization of devices and improvements inintegration density, the semiconductor industry has developed newpackages and processes for integrated the semiconductor device into aconsumer product. There are numerous processes for packaging thesesemiconductor devices resulting in numerous different packageconfigurations. These packages can accommodate the reduced footprint ofthe semiconductor device with other components that may require, forexample, larger electrical connections with greater pitch.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is a cross sectional view of a simplified package substrate towhich a de-bonding and cleaning process may be applied in accordancewith some embodiments.

FIGS. 2A through 2B are a process for de-bonding a carrier substratefrom a package substrate and cleaning the package substrate inaccordance with some embodiments.

FIGS. 3A through 3C are views of a first tool for implementing ade-bonding and cleaning process in accordance with some embodiments.

FIGS. 4A and 4B are views of a second tool for implementing a de-bondingand cleaning process in accordance with some embodiments.

FIGS. 5A through 5C are views of an example configuration to place andremove a cover ring according to an embodiment.

FIGS. 6A through 6F are views of another example configuration to placeand remove a cover ring according to an embodiment.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.Further, process embodiments are discussed herein as being performed ina particular order; however, other embodiments contemplate thatprocesses can be performed in any logical order.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Some embodiments are discussed below in a specific context, namely ade-bonding and cleaning process applied to a fan-out or fan-inwafer-level package. However, aspects of this disclosure may be appliedin numerous other contexts, such as to any components that are bondedtogether with a release coating that are then subsequently de-bonded.Further, some modifications to processes and systems are discussedbelow, and one of ordinary skill in the art will readily understandadditional modifications that can be applied. Embodiments contemplatethese modifications.

FIG. 1 illustrates a cross sectional view of a simplified packagesubstrate 40, such as a fan-out or fan-in wafer-level package, bonded toa carrier substrate 44 by a Light-to-Heat-Conversion (LTHC) releasecoating 42. A de-bonding and cleaning process discussed herein may beapplied to this structure in FIG. 1, although embodiments contemplatevarious other packages, package substrates, and/or components.

The carrier substrate 44 may be a glass substrate, silicon substrate,aluminum oxide substrate, or the like, and may be a wafer. The LTHCrelease coating 42 is on the carrier substrate 44. The carrier substrate44 provides temporary mechanical and structural support duringprocessing steps to form the package substrate 40. The LTHC releasecoating 42 is formed on a surface of the carrier substrate 44. The LTHCrelease coating 42 is, for example, an oxide, a nitride, an organicmaterial, the like, or a combination thereof, such as a polyimide-basedmaterial. The LTHC release coating 42 can be formed using lamination,spin coating, the like, or a combination thereof.

The package substrate 40 comprises one or more integrated circuit dies46. The integrated circuit dies 46 each comprise a semiconductorsubstrate, such as silicon, doped or undoped, or an active layer of asemiconductor-on-insulator (SOI) substrate. The semiconductor substratemay include another elementary semiconductor, such as germanium; acompound semiconductor including silicon carbide, gallium arsenic,gallium phosphide, indium phosphide, indium arsenide, and/or indiumantimonide; an alloy semiconductor including SiGe, GaAsP, AlInAs,AlGaAs, GaInAs, GaInP, and/or GaInAsP; or combinations thereof. Othersubstrates, such as multi-layered or gradient substrates, may also beused. Devices, such as transistors, diodes, capacitors, resistors, etc.,may be formed in and/or on the semiconductor substrate and may beinterconnected by interconnect structures formed by, for example,metallization patterns in one or more dielectric layers on thesemiconductor substrate to form an integrated circuit.

Die connectors 48, such as conductive pillars (for example, comprising ametal such as copper), are exterior to the integrated circuit dies 46and are mechanically and electrically coupled to the respectiveintegrated circuit dies 46 on what may be referred to as respectiveactive sides of the integrated circuit dies 46. The die connectors 48electrically couple the respective integrated circuits of the integratecircuit dies 46.

A dielectric material 50 is on the active sides of the integratedcircuit dies 46. The dielectric material 50 laterally encapsulates thedie connectors 48, which have upper surfaces that are co-planar withupper surfaces of the dielectric material 50, and the dielectricmaterial 50 is laterally co-terminus with the respective integratedcircuit dies 46. The dielectric material 50 may be a polymer such aspolybenzoxazole (PBO), polyimide, benzocyclobutene (BCB), or the like; anitride such as silicon nitride or the like; an oxide such as siliconoxide, PhosphoSilicate Glass (PSG), BoroSilicate Glass (BSG),Boron-doped PhosphoSilicate Glass (BPSG), or the like; the like, or acombination thereof.

Back sides of the integrated circuit dies 46, or sides opposite from theactive sides, are adhered to the LTHC release coating 42 on the carriersubstrate 44 by an adhesive 51. The adhesive 51 may be any suitableadhesive, epoxy, or the like.

An encapsulant 52 at least laterally encapsulates the integrated circuitdies 46. The encapsulant 52 has a first surface that adjoins the LTHCrelease coating 42 and has a second surface that is co-planar with uppersurfaces of the dielectric material 50 and the die connectors 48. Theencapsulant 52 may be a molding compound, epoxy, or the like.

A redistribution structure 54 comprises one or more metallizationpattern 56 in one or more dielectric layer 58. At least a portion of theone or more metallization pattern 56 is electrically coupled to therespective integrated circuits on the integrated circuit dies 46 throughthe respective die connectors 48. The one or metallization pattern 56can comprise any of lines, vias, pads, the like, or a combinationthereof, and may comprise a conductive material, such as a metal, likecopper, titanium, tungsten, aluminum, or the like. The one or moredielectric layer 58 may be a polymer such as PBO, polyimide, BCB, or thelike; a nitride such as silicon nitride or the like; an oxide such assilicon oxide, PSG, BSG, BPSG, or the like; the like; or a combinationthereof.

The one or more metallization pattern 56 comprises an under-metal 60exposed on the redistribution structure 54. An external connector 62,such as a solder ball like a ball grid array (BGA) ball, is on theunder-metal 60. In some embodiments, the external connector 62 comprisessolder, such as a Sn—Ag alloy, a Sn—Ag—Cu alloy, or the like, and may belead-free or lead-containing.

In the configuration in FIG. 1, the package substrate 40 comprisesunsingulated packages. The package substrate 40 may comprise any numberof packages. The package substrate 40 is formed and processed on thecarrier substrate 44, which may be a wafer. As noted above, the packagesubstrate 40 can have various modifications or configurations, and FIG.1 is merely an example. Other package substrates may be used.

FIGS. 2A through 2G illustrate a process for de-bonding a carriersubstrate 44 from a package substrate 40 and cleaning the packagesubstrate 40 in accordance with some embodiments. In FIG. 2A, thepackage substrate 40 that is bonded to the carrier substrate 44 by theLTHC release coating 42 is mounted on a chuck 70 and within a frame 74using a tape 72. The package substrate 40 is mounted on the tape 72 suchthat the carrier substrate 44 is upwards away from the chuck 70, suchas, for example, the external connectors 62 of the package substrate 40being adhered to the tape 72.

In FIG. 2B, a de-bonding process is performed. A radiation exposure 76scans through the carrier substrate 44 to at least the LTHC releasecoating 42. When the radiation exposure 76 impinges upon the LTHCrelease coating 42, the LTHC release coating 42 decomposes, therebyde-bonding the carrier substrate 44 from the package substrate 40. Insome embodiments, the radiation exposure 76 is a laser scan, a singlewide-area exposure, or any other exposure, and may use infrared (IR)light, ultraviolet (UV) light, or the like. The details of the radiationexposure 76 may depend on the material used for the release coating. Forexample, UV light may be used when the release coating is a UV glue. Anyacceptable de-bonding process may be used to decompose the releasecoating between the package substrate 40 and the carrier substrate 44.After de-bonding, the carrier substrate 44 is removed, and asillustrated in FIG. 2C, residue 78 of the LTHC release coating 42 mayremain on a surface 80 of the package substrate 40.

In FIG. 2D, a cover ring 82 is placed over the frame 74 and contacts thetape 72. Although illustrated on chuck 70, the package substrate 40 maybe transferred to another module with a different chuck, or may besubsequently processed on the same chuck 70 in the same module, asdiscussed in more detail below. Hence, subsequent discussion of theprocess may occur in a same module (e.g., with a same chuck) as theforegoing steps, or may be performed in a different module (e.g., with adifferent chuck).

The cover ring 82 covers the frame 74 and exterior portions of the tape72 that do not directly underlie the package substrate 40. The coverring 82 encircles the package substrate 40. The cover ring 82 maycontact the tape 72 to form an impermeable or semi-impermeable seal,which may prevent particle contamination on the tape 72. As illustrated,the cover ring 82 comprises a flange portion 82 a and an extendingportion 82 b. The flange portion 82 a is secured to the frame 74 and issubstantially in a plane parallel to the tape 72. The extending portion82 b extends from the flange portion 82 a and contacts the tape 72. Theextending portion 82 b encircles lateral sides of the package substrate40. A gap may be between the extending portion 82 b and the lateralsides of the package substrate 40. The cover ring 82 illustrated inthese figures is merely an example, and a cover ring may have manymodifications.

In FIG. 2E, a cleaning device 84 contacts the surface 80 of the packagesubstrate 40 to remove residue 78 from the surface 80. The cleaningdevice 84 can be a brush, a sponge, the like, or a combination thereof.A brush may include a base and bristles attached to the base. Thebristles may be a flexible, comb-like configuration of material.Exemplary materials include polyvinyl acetate (PVA), mohair, sponge,fibers, cloth, nylon, rayon, polyester, polymer, or the like. A spongemay comprise a PVA sponge or the like. The cleaning device 84 passesover and in contact with the surface 80 to physically remove the residue78 from the surface. A cleaning mechanism does not include mere use ofchemicals and does not include mere use of a chemical mechanicalpolishing (CMP) process and tool.

A fluid 88 is sprayed from a spray nozzle 86. The fluid 88 may rinse thesurface 80 as the cleaning device 84 passes over the surface 80. Thus,the fluid 88 may assist in removing residue 78 and particulates from thesurface 80. The fluid 88 may be de-ionized (DI) water, isopropyl alcohol(IPA), a combination thereof, or the like. The cleaning device 84 maypass over and in contact with the surface 80 any number of times tosufficiently remove the residue 78.

In FIG. 2F, the surface 80 of the package substrate 40 is shown to befree of particulates and residue 78, which includes substantially allparticulates and residue being removed from the surface 80. In FIG. 2G,the cover ring 82 is removed, and the package substrate 40 issubsequently transferred back to a frame cassette. Subsequently, thepackage substrate 40 is diced or sawed to singulate individual packagesthat were formed in the package substrate 40.

FIG. 3A illustrates a first tool 100 for implementing a de-bonding andcleaning process in accordance with some embodiments, and FIGS. 3B and3C illustrate further aspects of modules of the tool 100 in FIG. 3A. Thetool 100 comprises an Equipment Front End Module (EFEM) 102, apre-alignment module 104, a de-bond module 106, a carrier recycle module108, and a clean module 110. The tool 100 also comprises a control box116 and a power supply 118. The control box 116 may comprise one or moreelectronic controllers and/or processors that control an automatedprocess of the tool 100, such as in accordance with a recipe supplied bymemory (e.g., a non-transitory medium) in the control box 116 or remotefrom the tool 100. The tool 100 may have one control box 116 to automateand control all of the tools and modules in the tool 100, or may haveseparate control boxes 116 to automate and control one or more of themodules in tool 100 and tools within the modules. The power supply 118supplies an appropriate power to various components within the tool 100.The tool 100 may have one power supply 118 to provide power to all ofthe modules in the tool 100, or may have separate power supplies 118 toprovide power to one or more of the modules in the tool 100. Framecassettes 112 and Front Opening Unified Pods (FOUPs) 114 are illustratedcoupled to the EFEM 102 of the tool 100.

The EFEM 102 comprises a transfer tool 120 that is capable oftransferring substrates between modules and to and from frame cassettes112 and FOUPs 114. The transfer tool 120 may comprise a robot arm,transfer guides, or the like. The transfer tools 120 may be controlledby an electronic controller and/or processor in a control box 116 suchthat the transfer of substrates is automated, such as in accordance witha recipe.

The pre-alignment module 104 comprises an alignment tool that is capableof aligning substrates appropriately for processing. A frame cassette112 having the substrates to be de-bonded, e.g., the package substrate40 and carrier substrate 44, is coupled to the EFEM 102. The transfertool 120 in the EFEM 102 transfers the substrates 40 and 44 from a framecassette 112 to the alignment tool in the pre-alignment module 104 wherethe substrates 40 and 44 are aligned for subsequent processing. Thealignment tool, or further, the pre-alignment module 104, may becontrolled by an electronic controller and/or processor in a control box116 such that the alignment of substrates is automated, such as inaccordance with a recipe.

Referring to FIGS. 3A and 3B, the de-bond module 106 comprises aradiation source 122, a chuck 124 with a frame 126, a motor 128, a robotarm 130, and a vacuum system 132. The chuck 124 with the frame 126 isconfigured to support a substrate, e.g., package substrate 40 andcarrier substrate 44, during a de-bonding process. The motor 128 isconfigured to rotate 136 the chuck 124, and hence, a substrate on thechuck 124. The radiation source 122 is configured to emit radiation 134toward a substrate on the chuck 124. The radiation source 122 can emitany appropriate radiation, such as IR light, UV light, or the like, inany acceptable form, such as laser or any acceptable exposure, that iscapable of decomposing a release coating used to bond substrates 40 and44. The vacuum system 132 is mounted on and/or integrated into the robotarm 130. The robot arm 130 is configured to rotate 138 and/or telescope140 to position the vacuum system 132 in contact with the carriersubstrate 44 once de-bonded and transfer the carrier substrate 44 to thetransfer tool 120 of the EFEM 102. The vacuum system 132 is configuredto provide a pressure differential, such as a vacuum, when in contactwith the carrier substrate 44 sufficient to secure the carrier substrate44 to the robot arm 130. Each of the tools and components in the de-bondmodule 106 may be controlled by an electronic controller and/orprocessor in a control box 116 such that the de-bonding and transferringof substrates is automated, such as in accordance with a recipe.

The de-bond module 106 may implement the process discussed with respectto FIGS. 2A through 2C. As in FIG. 2A, a package substrate 40 that isbonded to a carrier substrate 44 by a release coating is mounted on thechuck 124 and within the frame 126 using a tape (not shown). Thetransfer tool 120 of the EFEM 102 may transfer the substrates 40 and 44from the pre-alignment module 104 and mount the substrates 40 and 44 onthe chuck 124. Once mounted, the motor 128 may begin rotating 136 thechuck 124 and the substrates 40 and 44. The rotation 136 may facilitatea radiation 134 exposure, such as a laser scan. In other embodiments, norotation of the chuck and substrates is needed, for example, if the scanis implemented solely by the radiation source 122 or if no scan is used,such as when an entire area exposure is used.

The radiation source 122 provides a radiation 134 directed at thesubstrates 44 and 40 for performing a de-bonding process, such asdiscussed above with respect to FIG. 2B. As discussed above, radiation134 can scan through the carrier substrate 44 to at least the releasecoating to decompose the release coating, thereby de-bonding the carriersubstrate 44 from the package substrate 40. Any acceptable de-bondingprocess may be used to decompose the release coating between the packagesubstrate 40 and the carrier substrate 44. Once the release film issufficiently decomposed, the motor 128 terminates rotation 136 of thechuck 124 and substrates 40 and 44, if rotation 136 was used duringde-bonding.

After de-bonding, the robot arm 130 rotates 138 to position the vacuumsystem 132 directly over the carrier substrate 44, and then, telescopes140 downwardly until the vacuum system 132 contacts the carriersubstrate 44. The vacuum system 132 is turned on and/or the pressuredifferential is increased once the vacuum system 132 contacts thecarrier substrate 44, thereby securing the carrier substrate 44. Therobot arm 130 then telescopes 140 upwardly to separate the carriersubstrate 44 from the package substrate 40. The robot arm 130 may thenrotate 138 to a position that is not directly over the package substrate40. The transfer tool 120 may then secure the carrier substrate 44, andthe vacuum system 132 may release the carrier substrate 44. The transfertool 120 then transfers the carrier substrate 44 to the carrier recyclemodule 108.

The carrier recycle module 108 may comprise any appropriate tools torecondition carrier substrates for subsequent re-use. For example, thecarrier recycle module 108 may comprise an immersion tank into whichcarrier substrates are placed with appropriate solvents to removeparticulates or residue, such as of the release coating from bondingwith a package substrate. Once the carrier substrate 44 is appropriatelyreconditioned, the transfer tool 120 of the EFEM 102 transfers thecarrier substrate 44 to a FOUP 114, which may then be detached andtransferred to another tool to re-use the carrier substrate 44. Theimmersion tank, and/or any other tools of the carrier recycle module108, may be controlled by an electronic controller and/or processor in acontrol box 116 such that the processes implemented in the carrierrecycle module 108 are automated, such as in accordance with a recipe.

After de-bonding, residue of the release coating may remain on thepackage substrate 40, such as illustrated in FIG. 2C. The transfer tool120 of the EFEM 102 transfers the package substrate 40 to the cleanmodule 110 so that a cleaning process can be performed on the packagesubstrate 40 to remove any residue and particulates.

Referring to FIGS. 3A and 3C, the clean module 110 comprises a chuck 150with a frame 152, a motor 154, a cover ring 156, a robot arm 158, and acleaning system. The chuck 150 with the frame 152 is configured tosupport a substrate, e.g., package substrate 40, during a cleaningprocess. The motor 154 is configured to rotate 168 the chuck 150, andhence, a substrate on the chuck 150.

The cover ring 156 can be a separable component in the clean module 110or can be attached to the frame 152, for example. In some embodiments,as shown in FIGS. 5A and 5B, the cover ring 156 is placed on the frame152 and chuck 150 by a reciprocating arm 252 in the clean module 110. Toplace the cover ring 156, the reciprocating arm can extend out 250, suchas downwardly from above the chuck 150, and place the cover ring 156 onthe frame 152 where one or more clamps 254 can secure the cover ring 156to the frame 152. As shown in FIGS. 5B and 5C, to remove the cover ring156, the reciprocating arm 252 can extend out, secure the cover ring156, and remove the cover ring 156 from the frame 152, such as byretracting 256 the reciprocating arm 252. In other embodiments, thecover ring 156 is attached to the frame 152, such as by a hingemechanism. An example is shown in FIGS. 6A through 6F, where FIGS. 6Athrough 6C are cross sectional views, and FIGS. 6D through 6F areoverhead views. The cover ring 156 can be in multiple separate portions156 a, with each portion 156 a attached by a hinge mechanism to theframe 152. When the cover ring 156 is to be placed for use (e.g., or tobe closed as shown in FIGS. 6B and 6E), each portion 156 a can berotated 260 by the hinge mechanism and/or a servo motor, for example,into place as shown in FIGS. 6A, 6B, 6D, and 6E. When the cover ring 156is to be moved away (e.g., or to be opened as shown in FIGS. 6C and 6F),each portion 156 a can be rotated 262 by the hinge mechanism and/or theservo motor, for example, away from the chuck 150 as shown in FIGS. 6Cand 6F. Other configurations of the cover ring 156 may be used.

The cleaning system is mounted on and/or integrated into the robot arm158. The cleaning system comprises a cleaning device 160, a spray nozzle162, tubing 164 for supplying a fluid to the cleaning device 160, andtubing 166 for supplying a fluid to the spray nozzle 162. The cleaningdevice 160 can be a brush, a sponge, the like, or a combination thereof.A brush may include a base and bristles attached to the base. Thebristles may be a flexible, comb-like configuration of material.Exemplary materials include PVA, mohair, sponge, fibers, cloth, nylon,rayon, polyester, polymer, or the like. A sponge may comprise a PVAsponge or the like. The fluid may be supplied through the tubing 164 and166 from a tank or reservoir in the clean module 110 or from a locationremote from the clean module 110. Although the spray nozzle 162 isillustrated as being on and/or integrated into the robot arm 158 in thisembodiment, the spray nozzle 162 may be in a fixed location in the cleanmodule 110 separate from the robot arm 158 or may be on a differentrobot arm separate from the cleaning device 160.

The robot arm 158 is configured to rotate 170 and/or telescope 172 toposition the cleaning system in contact with the package substrate 40.The cleaning system is configured such that the cleaning device 160 cancontact the package substrate 40 and the spray nozzle 162 can spray afluid on the package substrate 40 during a cleaning process. Each of thetools and components in the clean module 110 may be controlled by anelectronic controller and/or processor in a control box 116 such thatthe cleaning of substrates is automated, such as in accordance with arecipe.

The clean module 110 may implement the process discussed with respect toFIGS. 2D through 2G. As in FIG. 2D, a package substrate 40 is mounted onthe chuck 150 and within the frame 152 using a tape (not shown). Thetransfer tool 120 of the EFEM 102 may transfer the package substrate 40from the de-bond module 106 and mount the package substrate 40 on thechuck 150. Once mounted, the cover ring 156 is placed on the frame 152and the chuck 150. The placing of the cover ring 156 may use thereciprocating arm or the rotation of cover ring portions to “close” thecover ring 152 as discussed above. Then, the motor 154 may beginrotating 168 the chuck 150 and the package substrate 40. The rotation168 may facilitate cleaning. In other embodiments, no rotation of thechuck and package substrate is needed.

The robot arm 158 rotates 170 to position the cleaning system directlyabove the package substrate 40. The robot arm 158 then telescopes 172downwardly until the cleaning device 160 contacts the package substrate40. The cleaning device 160 can start at or proximate a center of thepackage substrate 40, and the robot arm 158 can rotate 170 towards anouter edge of the package substrate 40 while the motor 154 rotates thechuck 150 and the package substrate 40. In this manner, the cleaningdevice 160 may contact and clean substantially an entirety of a surfaceof the package substrate 40 (e.g., surface 80 in FIG. 2E). Once thecleaning device 160 reaches the outer edge of the package substrate 40,the robot arm 158 can telescope 172 upwardly and rotate 170 away fromthe package substrate 40. These actions of the cleaning device 160contacting the package substrate 40 and passing over the packagesubstrate 40 may be repeated any number of times. The cleaning device160 may contact the package substrate 40 in different manners, anddifferent techniques for passing the cleaning device over the packagesubstrate 40 may be used.

Fluid may be supplied to the package substrate 40 in many different waysto facilitate the cleaning process. For example, once directly above thepackage substrate 40, the spray nozzle 162 can begin spraying a fluid,such as DI water IPA, or the like, supplied through tubing 166 onto thepackage substrate 40, such as illustrated in FIG. 2E. The fluid suppliedthrough the tubing 166 and spray nozzle 162 may be sprayed only brieflyupon initiation of contact of the cleaning device 160 with the packagesubstrate 40, only throughout contact of the cleaning device 160 withthe package substrate 40, throughout the contact and after contact ofthe cleaning device 160 with the package substrate 40, or any variationtherebetween.

Once the robot arm 158 is clear of the package substrate 40 on the chuck150, fluid, such as DI water or the like, may be supplied through tubing164 onto the cleaning device 160 to rinse off any particulates that mayhave collected on the cleaning device 160 during cleaning from thecleaning device 160. Further, fluid supplied through tubing 164 and thecleaning device 160 may supplement fluid sprayed from the spray nozzle162 during the cleaning process.

After the fluid being supplied to the package substrate 40 is turned offand the cleaning device 160 does not contact the package substrate 40,the motor 154 may continue to rotate 168 the chuck 150 and packagesubstrate 40 (which may include increasing a rotational velocity) suchthat any fluid or loose particulates on the package substrate 40 may beremoved by a centrifugal force of the rotation 168. The manner in whichthe package substrate 40 is cleaned, such as including how the cleaningdevice 160 contacts the package substrate 40 and how fluid is suppliedthrough tubing 164 and 166, may be varied in many different ways, andthe embodiments discussed herein are merely examples of how the cleaningmay be performed.

Once rotation 168 of the chuck 150 ceases, the cover ring 156 isremoved, such as by using the reciprocating arm or by rotating coverring portions to “open” the cover ring 156. Then, the transfer tool 120of the EFEM 102 transfers the package substrate 40 from the chuck 150 inthe clean module 110 to a frame cassette 112. The frame cassette 112 canthen be detached from the EFEM 102 of the tool 100 and taken to anothertool for subsequent processing, such as sawing or dicing of the packagesubstrate 40 into individual packages.

FIG. 4A illustrates a second tool 200 for implementing a de-bonding andcleaning process in accordance with some embodiments, and FIG. 4Billustrates further aspects of a module of the tool 200 in FIG. 4A. Thetool 200 comprises many of the same modules as the tool 100 in FIG. 3A,including the EFEM 102, the pre-alignment module 104, and the carrierrecycle module 108. These modules may comprise the same tools, functionthe same, and be controlled in the same manner as discussed above withrespect to FIGS. 3A through 3B.

The tool 200 comprises de-bond and clean modules (DBCMs) 202 and 204. Asillustrate in FIG. 4A, the tool 200 comprises two DBCMs 202 and 204, andother embodiments contemplate one DBCM or more DBCMs in a tool. EachDBCM 202 and 204 incorporates substantially all of the tools andfunctions of both a de-bond module 106 and a clean module 110 discussedabove in FIGS. 3B and 3C. Each DBCM 202 and 204 comprises a radiationsource 122, a robot arm 130, vacuum system 132, robot arm 158, cleaningdevice 160, spray nozzle 162, and tubing 164 and 166. These tools areconfigured the same, perform the same functions, and are controlled thesame as discussed with respect to FIGS. 3B and 3C. Each DBCM 202 and 204further comprises a chuck 210 with a frame 212, cover ring 214, and amotor 216. The chuck 210, frame 212, cover ring 214, and motor 216 areconfigured substantially the same, perform substantially the samefunctions, and are controlled substantially the same as the chucks 124and 150 with frames 126 and 152, respectively, cover ring 156, andmotors 128 and 154 discussed in FIGS. 3B and 3C, except without the needto transfer a package substrate between the de-bond module 106 and theclean module 110.

As with tool 100 in FIG. 3A, the transfer tool 120 in the EFEM 102transfers the substrates 40 and 44 from a frame cassette 112 to thealignment tool in the pre-alignment module 104 where the substrates arealigned for subsequent processing.

Each DBCM 202 and 204 may implement the process discussed with respectto FIGS. 2A through 2G. As in FIG. 2A, a package substrate 40 that isbonded to a carrier substrate 44 by a release coating is mounted on thechuck 210 and within the frame 212 using a tape (not shown). Thetransfer tool 120 of the EFEM 102 may transfer the substrates 40 and 44from the pre-alignment module 104 and mount the substrates on the chuck210. Once mounted, the motor 216 may begin rotating 218 the chuck 210and the substrates 40 and 44, if such rotation 218 is used.

The radiation source 122 provides radiation 134 directed at thesubstrates 44 and 40 for performing a de-bonding process, such asdiscussed above with respect to FIG. 2B and FIG. 3B. As previouslydiscussed, any acceptable radiation may be used to decompose a releasecoating for de-bonding. Once the release film is sufficientlydecomposed, the motor 216 terminates rotation 218 of the chuck 210 andsubstrates 40 and 44, if rotation 218 was used during de-bonding.

After de-bonding, the robot arm 130 rotates 138 to position the vacuumsystem 132 directly over the carrier substrate 44, and then, telescopes140 downwardly until the vacuum system 132 contacts the carriersubstrate 44. The vacuum system 132 is turned on and/or the pressuredifferential is increased once the vacuum system 132 contacts thecarrier substrate 44, thereby securing the carrier substrate 44. Therobot arm 130 then telescopes 140 upwardly to separate the carriersubstrate 44 from the package substrate 40. The robot arm 130 may thenrotate 138 to a position that is not directly over the package substrate40. The transfer tool 120 may then secure the carrier substrate 44, andthe vacuum system 132 may release the carrier substrate 44. The transfertool 120 then transfers the carrier substrate 44 to the carrier recyclemodule 108, which may process the carrier substrate 44 as discussedabove.

After de-bonding, residue of the release coating may remain on thepackage substrate 40, such as illustrated in FIG. 2C. A cleaning processis then performed in the DBCM 202 or 204 on the package substrate 40 toremove any residue and particulates. In this embodiment, the packagesubstrate 40 remains secured to the chuck 210 for the subsequentcleaning process. The cover ring 214 is placed on the frame 212 and thechuck 210. The placing of the cover ring 214 may use a reciprocating armor a rotation of cover ring portions to “close” the cover ring 214. Themotor 216 may begin rotating 218 the chuck 210 and the package substrate40. The rotation 218 may facilitate cleaning. In other embodiments, norotation of the chuck and package substrate is needed.

The robot arm 158 rotates 170 to position the cleaning system directlyabove the package substrate 40. The robot arm 158 then telescopes 172downwardly until the cleaning device 160 contacts the package substrate40. The cleaning device 160 can start at or proximate a center of thepackage substrate 40, and the robot arm 158 can rotate 170 towards anouter edge of the package substrate 40 while the motor 216 rotates thechuck 210 and the package substrate 40. In this manner, the cleaningdevice 160 may contact and clean substantially an entirety of a surfaceof the package substrate 40 (e.g., surface 80 in FIG. 2E). Once thecleaning device 160 reaches the outer edge of the package substrate 40,the robot arm 158 can telescope 172 upwardly and rotate 170 away fromthe package substrate 40. These actions of the cleaning device 160contacting the package substrate 40 and passing over the packagesubstrate 40 may be repeated any number of times. The cleaning device160 may contact the package substrate 40 in different manners, anddifferent techniques for passing the cleaning device over the packagesubstrate 40 may be used.

Fluid may be supplied to the package substrate 40 in many different waysto facilitate the cleaning process. For example, once directly above thepackage substrate 40, the spray nozzle 162 can begin spraying a fluid,such as DI water IPA, or the like, supplied through tubing 166 onto thepackage substrate 40, such as illustrated in FIG. 2E. The fluid from thespray nozzle 162 and tubing 166 may be dispensed or supplied asdiscussed above.

Once the robot arm 158 is clear of the package substrate 40 on the chuck150, fluid, such as DI water or the like, may be supplied through tubing164 onto the cleaning device 160 to rinse off any particulates that mayhave collected on the cleaning device 160 during cleaning from thecleaning device 160. Further, fluid supplied through tubing 164 and thecleaning device 160 may supplement fluid sprayed from the spray nozzle162 during the cleaning process.

After the fluid being supplied to the package substrate 40 is turned offand the cleaning device 160 does not contact the package substrate 40,the motor 216 may continue to rotate 218 the chuck 210 and packagesubstrate 40 (which may include increasing a rotational velocity) suchthat any fluid or loose particulates on the package substrate 40 may beremoved by a centrifugal force of the rotation. The manner in which thepackage substrate 40 is cleaned, and the embodiments discussed hereinare merely examples of how the cleaning may be performed.

Once rotation 218 of the chuck 210 ceases, the cover ring 214 isremoved, such as by using the reciprocating arm or by rotating coverring portions to “open” the cover ring 214. Then, the transfer tool 120of the EFEM 102 transfers the package substrate 40 from the chuck 210 inthe DBCM 202 or 204 to a frame cassette 112. The frame cassette 112 canthen be detached from the EFEM 102 of the tool 200 and taken to anothertool for subsequent processing, such as sawing or dicing of the packagesubstrate 40 into individual packages.

Embodiments may achieve advantages. Using a frame-type chuck in thede-bonding process can increase the process stability, which canincrease a yield of manufactured packages. Hence, processing forpackages may become more robust. Additionally, using a cover ring duringcleaning can help avoid particulate contamination or pollution of thetape on which the package substrate is secured. Further, integrating thede-bonding and cleaning processes into a single tool, which may be fullyautomated, can reduce space needed for such tools on a manufacturingfloor, and can reduce labor costs. Even further, by using a physicalclean process, such as with a cleaning device, harsh chemical solventsmay be avoided, which can result in the cleaning process being greeneror more environmentally friendly.

According to an embodiment, a method comprises de-bonding a surface of afirst substrate from a second substrate, and after de-bonding, cleaningthe surface of the first substrate. The cleaning comprises physicallycontacting a cleaning mechanism to the surface of the first substrate.

According to another embodiment, a method comprises providing a packagesubstrate bonded to a carrier substrate by a release coating, therelease coating being on a surface of the package substrate; decomposingthe release coating and separating the carrier substrate from thepackage substrate; and after separating the carrier substrate from thepackage substrate, cleaning the surface of the package substrate. Thecleaning includes supplying a fluid to the surface of the packagesubstrate and contacting the surface of the package substrate with acleaning mechanism to physically remove residue of the release coatingfrom the surface of the package substrate.

Another embodiment is a tool. The tool comprises a de-bonding module anda cleaning module. The de-bonding module comprises a first chuck, aradiation source configured to emit radiation toward the first chuck,and a first robot arm having a vacuum system. The vacuum system isconfigured to secure and remove a substrate from the first chuck. Thecleaning module comprises a second chuck, a spray nozzle configured tospray a fluid toward the second chuck, and a second robot arm having acleaning device configured to physically contact the cleaning device toa substrate on the second chuck.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

In the claims:
 1. A method comprising: de-bonding a surface of a firstsubstrate from a second substrate, the first substrate being attached toa tape; after de-bonding the first substrate, placing a cover ring overa portion of the tape, the cover ring encircling the first substrate;and after de-bonding, cleaning the surface of the first substrate, thecleaning comprising physically contacting a cleaning mechanism to thesurface of the first substrate, wherein during the cleaning the surface,the cover ring covers the tape.
 2. The method of claim 1, wherein thede-bonding comprises decomposing a release coating on the surface of thefirst substrate and between the first substrate and the secondsubstrate, a residue of the release coating remaining on the surfaceafter the de-bonding, the cleaning mechanism physically removing theresidue during the cleaning the surface.
 3. (canceled)
 4. The method ofclaim 1, wherein the cleaning mechanism comprises a sponge.
 5. Themethod of claim 1, wherein the cleaning mechanism comprises a brush. 6.The method of claim 1, wherein the cleaning the surface of the firstsubstrate comprises supplying a fluid to the surface of the firstsubstrate.
 7. The method of claim 6, wherein the fluid comprisesdeionized water.
 8. The method of claim 6, wherein the fluid comprisesisopropyl alcohol.
 9. A method comprising: providing a package substratebonded to a carrier substrate by a release coating, the release coatingbeing on a surface of the package substrate; placing the packagesubstrate on a tape, the package substrate being interposed between thecarrier substrate and the tape; decomposing the release coating andseparating the carrier substrate from the package substrate; afterseparating the carrier substrate from the package substrate, placing thepackage substrate in a cleaning module; after placing the packagesubstrate in the cleaning module, placing a cover ring over a portion ofthe tape adjacent the package substrate; and cleaning the surface of thepackage substrate, the cleaning including supplying a fluid to thesurface of the package substrate and contacting the surface of thepackage substrate with a cleaning mechanism to physically remove residueof the release coating from the surface of the package substrate. 10.The method of claim 9, wherein the fluid comprises deionized water,isopropyl alcohol, or a combination thereof.
 11. The method of claim 9,wherein the cleaning mechanism comprises a brush, a sponge, or acombination thereof.
 12. The method of claim 9, wherein during thecleaning, the cover ring covers portions of the tape that the packagesubstrate is not on during the cleaning.
 13. The method of claim 9,wherein the decomposing the release coating comprises using a laserlight scan.
 14. A tool comprising: a de-bonding module comprising: afirst chuck, a radiation source configured to emit radiation toward thefirst chuck, and a first robot arm having a vacuum system, the vacuumsystem configured to secure and remove a substrate from the first chuck;and a cleaning module comprising: a second chuck, a frame attached tothe second chuck, a cover ring attached to the frame, the cover ringbeing configured to encircle the substrate on the second chuck and tocover at least a portion of the second chuck, a spray nozzle configuredto spray a fluid toward the second chuck, and a second robot arm havinga cleaning device configured to physically contact the cleaning deviceto a substrate on the second chuck.
 15. The tool of claim 14, whereinthe de-bonding module and the cleaning module are part of a same module,the first chuck and the second chuck being a same chuck.
 16. The tool ofclaim 14, wherein the de-bonding module and the cleaning module areseparate modules.
 17. The tool of claim 14 further comprising a transfertool configured to transfer a substrate between modules.
 18. (canceled)19. The tool of claim 14, wherein the spray nozzle is on the secondrobot arm.
 20. The tool of claim 14, wherein the cleaning modulecomprises a motor configured to rotate the second chuck.
 21. The methodof claim 1, further comprising clamping the cover ring to a frame usinga clamp, the clamp extending over a portion of the cover ring.
 22. Thetool of claim 14, wherein the cleaning module further comprises a clampextending over the cover ring configured to secure the cover ring duringprocessing.